PtS2 film on SiO2/Si

CVD grown PtS₂ film

Depending on the number of layers, PtS₂ converts from semiconductor to type-II Dirac semimetal with bandgap ranging from 0 to 1.6 eV, which is a promising material for several applications such as gas sensing, photovoltaic, and photodetector applications etc. [Zhao, Donghui, et al. “Synthesis of large-scale few-layer PtS2 films by chemical vapor deposition.” AIP Advances 9.2 (2019): 025225.] We grow high-quality ultrathin PtS₂ film on various substrates. The quality of the grown PtS₂ film by our growth method is confirmed using several complementary characterization techniques, such as optical microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy, etc.

Key characteristics:

• Thickness: Based on AFM imaging, the thickness and surface roughness was precisely measured. Thickness of the PtS₂ film can be tuned in the range of 1nm~ 20 nm.

As grown

Standard Substrates: SiO₂ on Si, c-plane Sapphire, Quartz (fused silica), Gold Single Crystal, Gold Foil

Customized samples:

We can provide PtS₂ film grown or transferred on to your choice of substrate (e.g. Flexible substrates, silicon waveguides, optical fibers etc.). Contact our experts via your login page dashboard to discuss the options. Additional costs involved for customization services

References:

Cite the papers here